Hollandia – Laboratóriumi, optikai és precíziós felszerelések (kivéve szemüvegek) – 2-Photon Polymerization Lithography System
Kirjeldus
NWO Institute AMOLF wishes to purchase a system for 2-Photon Polymerization Lithography (2-PPL) for micro 3D printing. It will serve as a part of our micro- and nanofabrication facility. This tool will expand the capabilities of the AMOLF NanoLab Amsterdam. 2PP is a method for the fabrication of highly precise microscale objects such as microlenses, microfluidic devices, and experimental optical structures. Due to its high precision and flexibility in the possible structures, it is a technique that can be applied in a number of different fields, such as nanophotonics, iophysics, and micromechanics. These are fields that require high level of control over the used structures in order to tune them to the needs of the researcher. The system will be used in a research cleanroom by a wide range of users with varying levels of experience, under the guidance of more experienced staff. One 2-Photon Polymerization Lithography System
CPV koodid
Dokumendid & esitamine
Contains data from Tenders Electronic Daily (TED), © European Union, ted.europa.eu — CC BY 4.0.
Seotud hanked
Hollandia – Laboratóriumi, optikai és precíziós felszerelések (kivéve szemüvegek) – Cryogen free dilution refrigerator
Stichting Nederlandse Wetenschappelijk Onderzoek Instituten (NWO-I)HollandLaboratory, optical and precision equipments (excl. glasses)Tähtajaks on 51 päevaAvaldatud 02. aug 2026
Hollandia – Észlelő- és analizálóberendezések – Levering en onderhoud Fotometrisch analysestysteem (autoanalyzer) t.b.v. RWS
Rijksinstituut voor Volksgezondheid en Milieu (RIVM)HollandDetection and analysis apparatusAnalysis apparatusSpectrometersTähtajaks on 49 päevaAvaldatud 21. juuli 2026
Hollandia – Laboratóriumi, optikai és precíziós felszerelések (kivéve szemüvegek) – Hard X-ray Photoelectron Spectroscopy System for Energy Materials Characterization
Technische Universiteit EindhovenHollandLaboratory, optical and precision equipments (excl. glasses)Tähtajaks on 24 päevaAvaldatud 16. juuli 2026
Hollandia – Laboratóriumi, optikai és precíziós felszerelések (kivéve szemüvegek) – European Tender Electron Beam Lithography system
Universiteit TwenteHollandLaboratory, optical and precision equipments (excl. glasses)Electron-beam recordersTähtajaks on 18 päevaAvaldatud 08. juuli 2026