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Germany – Microelectronic machinery and apparatus and microsystems – Reactive ion etcher
Max-Planck-Institut für Struktur und Dynamik der MaterieGermanyPublished on Mar 24, 2026
No deadline given
GermanyDescription
Manufacture, distribution and service of plasma etching systems (RIE/ICP-RIE) for micro- and nano-fabrication. For further details, please refer to the specification document.
CPV codes
Microelectronic machinery and apparatus and microsystemsElectromechanical equipmentLaboratory, optical and precision equipments (excl. glasses)
Documents & submission
AI summary
Sign in for an AI summaryContains data from Tenders Electronic Daily (TED), © European Union, ted.europa.eu — CC BY 4.0.
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