Spain – Microelectronic machinery and apparatus and microsystems – Suministro de sistema de litografía por escritura directa mediante láser (Direct Laser Writing, DLW)

This report aims to justify the need and suitability of contracting the supply, installation, commissioning, validation and associated training of a direct laser writing (DLW) lithography system, in accordance with Article 28 of Law 9/2017 of 8 November, on Public Sector Contracts (LCSP), which transposes into Spanish law the Directives of the European Parliament and of the Council 2014/23/EU and 2014/24/EU of 26 February 2014, as well as in the concordant provisions that require the preparation of a report on the insufficiency of resources, need and suitability of the contract prior to the commencement of the procurement procedure. The equipment will be destined for the Singular Scientific and Technical Infrastructure (ICTS) MICRONANOFABS, the Spanish network of clean rooms for micro and nanofabrication integrated into the National Map of ICTS of the competent Ministry in matters of science, of which the Micro and Nano Fabrication Infrastructure of the Nanophotonic Technology Centre (NTC) of the Universitat Politècnica de València (UPV) is a part, together with the National Centre of Microelectronics (CSIC) and the Technology Centre of ISOM (UPM). The installation will be located in the Clean Room of building 8F of the NTC-UPV. The Nanophotonic Technology Centre carries out research and manufacturing activities in the fields of integrated photonics, nanotechnology, biosensing, microoptics and microfluidic systems. Among the devices that are habitually manufactured are integrated photonic circuits (PICs), photonic biosensors, nanoantennas, optical resonators, photonic crystals, diffractive optical elements, metalenses and microlenses, three-dimensional structures obtained by means of Gray Scale lithography, MEMS devices, microfluidic systems, and photonic hybrid encapsulated and components. These devices require the combination of manufacturing processes with nanometric and micrometric resolutions, high levels of geometric precision, multi-layer alignment and high productivity that allows the manufacture of complete devices and wafers in times compatible with research activity and the provision of technological services. Therefore, the acquisition of a lithography system that offers simultaneously high resolution, high writing speed, mechanical stability, positioning precision and versatility to work on a wide variety of materials and substrate sizes is necessary. As an ICTS integrated into the MICRONANOFABS network, the NTC-UPV provides micro and nanofabrication services to national and international research groups, as well as to companies, within the framework of competitive projects, technology transfer contracts and the provision of advanced services. The equipment will be part of the scientific infrastructure of the centre and will be used for the development of national and international research projects, technology transfer contracts with companies and the provision of manufacturing services to internal and external users. This condition of singular shared-use infrastructure obliges to maintain an updated, robust and high-performance instrumental endowment, in line with the objectives of the PERTE Chip for the strengthening of national capabilities in microelectronics and photonics. The procurement is therefore necessary for the fulfilment and achievement of the institutional purposes of the ICTS MICRONANOFABS-NTC, there being no adequate, sufficient and available own means to meet this need, in the terms required by Article 28 LCSP.